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Ultrapure
Water2009
Conference
ULTRAPURE WATER
2009
is
a two-day conference on Microelectronics Pure Water, Pharmaceutical Water, and
High-Purity Water for Steam Power Generation. The
conference consists of state-of-the-art technical papers and
Table-Top exhibits. Preliminary details of the 2009 conference
and registration form are available as a PDF file:
UPW2009. Click here
for a Tabletop Reservation form.
Red
Lion Inn-Jantzen Beach
Hotel reservations: 503-283-4466
Fax: 503-283-4743
For special rates mention Ultrapure Water Conference. Register on-line at:
www.redlion.com/jantzenbeach use booking code: 1030ULTR
To register On-line on a secure checkout server, please: Click Here.
Conference Moderators:
Slava Libman, Ph.D., M+W
Zander U.S. Operations; Andreas Neuber, Ph.D., Applied Materials;
and Rich Riley, Intel
Wednesday, Nov. 4
9:00 AM—Session Introduction
9:15 AM—A Novel Photochemical Process for Water Purification
Mark Owen, Tom Hawkins, Ph.D., and Dave Moser, Puralytics
9:45 AM— Electro Positive Ion Exchange Cartridge Filter Media for Use in the Production of Ultrapure Water
Rodney Komlenic and Christine Stanfel, Ahlstrom Filtration, LLC
10:15-10:45 AM—Coffee Break
10:45 AM— Reverse Osmosis Pretreatment: Maximizing Membrane Performance
Jane Kucera, Nalco Co.
11:15 AM—Ozone Sanitization as a Cost Effective Alternative to Heat Sanitization
Hossein Zarrin and Hans Sundstrom,
MKS Instruments11:45 AM—Model Makeover for Reverse Osmosis Chemistry Modeling Software
Robert J. Ferguson and Baron R. Ferguson, French Creek Software
12:15 PM-1:45 PM—Lunch Break
1:45 PM— Reducing the Total Costs of RO Operation - The Art of Membrane Cleaning
Jantje Johnson, Genesys North America
2:15 PM—Wastewater Treatment and Reclamation from Silicon Processing Operations in the PV and Semiconductor Industries
Vivien Krygier, Ph.D., and Rolf Berndt, Ph.D.,
Pall Corp.2:45 PM—PV Manufacturing Overview and Water Management Challenges
Slava Libman, Ph.D.,
M+W Zander U.S. Operations; Sarah Schoen, Ph.D., Balazs NanoAnalysis; Andreas Neuber, Ph.D., Applied Materials; Marty Burkhart, Hi Pure Tech Inc.; and John Morgan, H2Morgan3:15 PM—Coffee Break Sponsored by SWAN Analytical Instruments
3:30 PM— Cost Effective High Purity Water Specification Development
Slava Libman, Ph.D.,
M+W Zander U.S. Operations; Sarah Schoen, Ph.D., Balazs NanoAnalysis; Andreas Neuber, Ph.D., Applied Materials; Marty Burkhart, Hi Pure Tech Inc.; and John Morgan, H2Morgan4:00 PM— Photovoltaic Facility Design - Approaches to Water and Wastewater Treatment
Dana Brumley, P.E., and Ralph Williams, P.E.,
CH2M Hill
4:30PM--2009 International Technology Roadmap for Semiconductors (ITRS)
Ultrapure Water Update
Jeff Chapman, IBM
5:00-6:30
PM—Reception in Exhibits Area
6:30 PM—ITRS Discussion
Thursday, Nov. 5
9:00 AM— Treatment of Silicon Grinder Water for Water Reuse
Ray Groves, EnviroGuard Inc.; Hans Voss, Caverion NA Inc
.; and Michael Ong and Bob McIntosh, SolarWorld9:30 AM— Quality Assurance of Process Measurements
Markus Bernasconi ,
SWAN Analytische Instrumente AG10:00 AM—Coffee Break
10:30 AM— Application of Statistical Methods To Monitor Continuous Processes in High-Tech Production Facilities
Gregory Carr, consultant
11:00 AM— Phosphorous Contamination from UPW in Wet Cleaning of Silicon Wafer
Drew Sinha, Ph.D.,
SUMCO USA; and Jeff Chapman, IBM; and Richard Godec, GE Instruments11:30 AM— Advanced Oxidation for the Removal of Organic Contaminants in Industrial Waters
Dr. Richard Woodling, Ph.D.; Feng Jing, Ph.D.
Siemens Water Technologies (Singapore); and Bruce Coulter, Siemens Water TechnologiesNoon-1:15 PM—Lunch in Exhibits Area
1:15 PM— UPW Sampling Valves: Minimizing Contamination For State-of-the-Art Sample Analysis
Sarah Schoen, Ph.D., and Betty Pennington, Balazs NanoAnalysis
1:45 PM—Nano101: A Synopsis of Select Research Projects at Purdue University’s Birck Nanotechnology Center
Timothy J Miller, Purdue University – Birck Nanotechnology Center
2:15 PM— A New Device for the Rapid Collection and Subsequent Elemental Identification of Sub-50-nm Particles in UPW
David Blackford, Ph.D.,
Fluid Measurement Technologies; Art Ackermann and Gen Wildermuth, Microfier2:45 PM— Managing Semiconductor Manufacturing Risk through Improved Control of Nano-particles in UPW
Andreas Neuber, Ph.D.,
Applied Materials; Bob Latimer, Hach Co.; Sarah Schoen, Ph.D., Balazs NanoAnalysis; Drew Sinha, Ph.D., SUMCO USA; David Blackford, Ph.D., Fluid Measurement Technologies Inc.; Slava Libman, Ph.D., M+W Zander3:15 PM—Conference Concludes
Participants will be asked to prepare both a technical paper, as well as a Power Point presentation. Each registrant will receive a CD containing the presentations. CDs are not available for sale outside the conference.
2009 Exhibitors
l
AHLSTROM FILTRATION INC. l AIR LIQUIDE-BALAZS NANOANALYSIS l AQUAFINE l ARKEMA l ASAHI AMERICA INC. l CHRIST WATER TECHNOLOGY l FLUID MEASUREMENT TECHNOLOGIES l GENESYS NORTH AMERICA l HEATEFLEX l HYDRANAUTICS l IN USA l METTLER TOLEDO THORNTON l OZONE SYSTEMS & TECHNOLOGY l PROMINENT FLUID CONTROLS l SIEMENS WATER TECHNOLOGIES l SWAN ANALYTICAL INSTRUMENTS l THE PUROLITE COMPANYClick here for a Tabletop Reservation form.